Nanomaterials with complex three-dimensional geometries can be fabricated using two-photon lithography, but are usually limited by the specific materials of existing photolithography resists. We have developed a two-photon lithography resist for the fabrication of mechanically robust and optically active metamaterials. This resist is composed of silver nanocluster photoactivators and is placed in a polyhedral oligomeric siloxane (POSS) polymer matrix. The printed nanocomposite materials have an elastic modulus that is 216% higher than that of the POSS structure, an energy absorption increase of 166%, and maintain an elastic recovery rate of 96%. The nanocomposite gyroscope nanogrid has a strain of up to 80% when it fails. The energy absorption rate of the nanogrid is one of the highest in lightweight nanoporous materials. Thermal annealing is used to convert the printed nanocomposite materials into nanoparticle-in-glass, with an energy absorption rate 54% higher than that of molten silicon. The gyroscope nanogrid after annealing contains silver nanoparticles and exhibits plasmonic activity. Right-handed and left-handed chiral nanogrids will produce different transmission spectra under linearly polarized light. This research was published in the journal Advanced Materials under the title "Mechanical and Optical Properties of Nanocluster-Silica Metamaterials".
References:
DOI: 10.1002/adma.202521526